CARLSBAD, Calif. and RESEARCH TRIANGLE PARK, N.C., Aug. 1, 2022 /PRNewswire/ — CUT&Tag is a targeted transposition technique that allows high-resolution genomic mapping of histone modifications and chromatin-associated proteins through the precise insertion of DNA sequences into the genome using the Tn5 transposase enzyme.
EpiCypher and Active Motif each own or control patents covering complementary aspects of targeted transposition. Active Motif and EpiCypher have leveraged their respective IP to independently create successful genomic mapping tools that allow researchers to employ targeted transposition / CUT&Tag for advanced epigenomics research. Since 2020, there has been a patent dispute between the companies that culminated in patent infringement litigation.
EpiCypher and Active Motif have recently agreed to put their differences aside and today announced the signing of a global settlement ending the ongoing litigation, and a mutual cross-licensing agreement of their respective intellectual property. These developments will effectively resolve all outstanding legal issues between the two companies in the targeted transposition / CUT&Tag space.
The companies agreed that both Active Motif and EpiCypher’s IP are equally valid, and that both sets of IP are required to commercialize products and services that use technology involving targeted transposition techniques such as CUT&Tag. As part of the cross-licensing agreement, EpiCypher and Active Motif each agreed to provide to the other company a non-exclusive, royalty-bearing license to enable commercialization of products, kits, and services that use targeted Tn5 / CUT&Tag-based workflows. The companies also agreed to pool their IP and work together to sublicense targeted tagmentation technology for emerging fields of use, including single cell and spatial genomics assays. This places Active Motif and EpiCypher in a very strong position in the targeted transposition market.
“Today’s announcement is great for EpiCypher, Active Motif, and our collective customers”, said Dr. Martis Cowles, Chief Business Officer of EpiCypher. “The Partnership between EpiCypher and Active Motif is a natural fit, and we look forward to working with Active Motif to maximize the impact of CUT&Tag technology on chromatin science and drug development”.
“Targeted transposition technology has become increasingly important in simplifying the study of Protein-DNA interactions”, said Ted DeFrank, President and CEO of Active Motif. Joe Fernandez, the Founder of Active Motif added, “We are pleased to be collaborating with EpiCypher to bring targeted transposition to the research and biotech communities.”
EpiCypher® is dedicated to developing transformative epigenetic solutions that advance the science of epigenetic regulation and improve human health. Most recently, EpiCypher has been at the leading edge of chromatin profiling technology with highly sensitive CUTANA™ epigenomic mapping assays for ChIC, CUT&RUN, and CUT&Tag. The Company also manufactures and sells the largest collection of defined “designer” nucleosomes (dNucs) on the market and offers a range of high-throughput nucleosome-based assays and services for chromatin research and drug development. For more information about EpiCypher, visit www.epicypher.com
Media Contact: Leslie Lewis, EpiCypher, Inc. [email protected]
About Active Motif
Active Motif, Inc. is dedicated to developing, manufacturing and delivering epigenetics-based research tools to analyze nuclear function. Its customers include scientists from academic and government institutions; biotechnology and pharmaceutical companies. Active Motif operates globally through its corporate headquarters in Carlsbad, California and offices in Shanghai China, Tokyo Japan and Waterloo Belgium. Active Motif applies a multi-disciplinary approach to create new and modify existing technologies to meet the current and future needs of life science researchers.
Media Contact: Fritz Eibel, Active Motif Incorporated, [email protected]
Disclaimer: The above press release comes to you under an arrangement with PR Newswire. Business Upturn takes no editorial responsibility for the same.